Spectrally resolved phase-shifting interferometry of transparent thin films: sensitivity of thickness measurements
Applied Optics, Vol. 45, Issue 34, pp. 8636-8640 (2006)
http://dx.doi.org/10.1364/AO.45.008636
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Abstract
Spectrally resolved white-light phase-shifting interference microscopy can be used for rapid and accurate measurements of the thickness profile of transparent thin-film layers deposited upon patterned structures exhibiting steps and discontinuities. We examine the sensitivity of this technique and show that it depends on the thickness of the thin-film layer as well as its refractive index. The results of this analysis are also valid for any other method based on measurements of the spectral phase such as wavelength scanning or white-light interferometry.
© 2006 Optical Society of America
OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.6200) Instrumentation, measurement, and metrology : Spectrometers and spectroscopic instrumentation
(240.0310) Optics at surfaces : Thin films
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: May 15, 2006
Revised Manuscript: July 5, 2006
Manuscript Accepted: July 22, 2006
Virtual Issues
Vol. 2, Iss. 1 Virtual Journal for Biomedical Optics
Citation
Sanjit K. Debnath, Mahendra P. Kothiyal, Joanna Schmit, and Parameswaran Hariharan, "Spectrally resolved phase-shifting interferometry of transparent thin films: sensitivity of thickness measurements," Appl. Opt. 45, 8636-8640 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-34-8636
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