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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 35 — Dec. 10, 2006
  • pp: 8932–8938

Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers

Yuichiro Ezoe, Masaki Koshiishi, Makoto Mita, Kazuhisa Mitsuda, Akio Hoshino, Yoshitaka Ishisaki, Zhen Yang, Takayuki Takano, and Ryutaro Maeda  »View Author Affiliations


Applied Optics, Vol. 45, Issue 35, pp. 8932-8938 (2006)
http://dx.doi.org/10.1364/AO.45.008932


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Abstract

To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 μm wide (111) sidewalls was fabricated using a 220 μm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3–5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.

© 2006 Optical Society of America

OCIS Codes
(170.3890) Medical optics and biotechnology : Medical optics instrumentation
(220.4000) Optical design and fabrication : Microstructure fabrication
(340.7470) X-ray optics : X-ray mirrors
(350.1260) Other areas of optics : Astronomical optics

History
Original Manuscript: March 1, 2006
Revised Manuscript: June 12, 2006
Manuscript Accepted: August 7, 2006

Virtual Issues
Vol. 2, Iss. 1 Virtual Journal for Biomedical Optics

Citation
Yuichiro Ezoe, Masaki Koshiishi, Makoto Mita, Kazuhisa Mitsuda, Akio Hoshino, Yoshitaka Ishisaki, Zhen Yang, Takayuki Takano, and Ryutaro Maeda, "Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers," Appl. Opt. 45, 8932-8938 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-35-8932


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