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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 36 — Dec. 20, 2006
  • pp: 9125–9131

TiO2―Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering

Cheng-Chung Lee and Chien-Jen Tang  »View Author Affiliations

Applied Optics, Vol. 45, Issue 36, pp. 9125-9131 (2006)

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TiO 2 ―Ta 2 O 5 composite films were prepared by a radio frequency ion-beam sputtering deposition process, and the refractive indices and extinction coefficients of the composite films were found to be between those of the TiO 2 and Ta 2 O 5 films. The structure of the as-deposited films was amorphous, and the surface roughness was approximately 0.1   nm . The residual stress of the composite films was less than that of pure TiO 2 film. The structure of the composite films after annealing was amorphous, with low surface roughness and slightly increased residual stress. The film containing 6.3% TiO 2 displayed better properties than either the pure TiO 2 or the pure Ta 2 O 5 film.

© 2006 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

Original Manuscript: May 9, 2006
Manuscript Accepted: August 8, 2006

Cheng-Chung Lee and Chien-Jen Tang, "TiO2-Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering," Appl. Opt. 45, 9125-9131 (2006)

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