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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 4 — Feb. 1, 2006
  • pp: 619–625

Side diffusion modeling by the explicit consideration of a space-charge buildup under the mask during strip waveguide formation in the Ag+–Na+ field-assisted ion-exchange process

Piotr Mrozek, Ewa Mrozek, and Tadeusz Lukaszewicz  »View Author Affiliations


Applied Optics, Vol. 45, Issue 4, pp. 619-625 (2006)
http://dx.doi.org/10.1364/AO.45.000619


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Abstract

A space-charge buildup under the blocking mask in a field-assisted Ag + Na + ion-exchange modeling is assumed. It results in the distortion of electric field lines in the direction under the mask edges. As a result, side diffusion occurs and the numerical model shows the same range of side diffusion as the experimental data. Explicit consideration of the space-charge buildup under the mask and solving the Poisson equation for the electric field determination make it possible to use more realistic boundary conditions in the numerical model, compared to the boundary conditions generally used.

© 2006 Optical Society of America

OCIS Codes
(000.4430) General : Numerical approximation and analysis
(230.7380) Optical devices : Waveguides, channeled

ToC Category:
Optical Devices

History
Original Manuscript: March 24, 2005
Manuscript Accepted: June 24, 2005

Citation
Piotr Mrozek, Ewa Mrozek, and Tadeusz Lukaszewicz, "Side diffusion modeling by the explicit consideration of a space-charge buildup under the mask during strip waveguide formation in the Ag+-Na+ field-assisted ion-exchange process," Appl. Opt. 45, 619-625 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-4-619

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