Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation
Applied Optics, Vol. 45, Issue 5, pp. 851-863 (2006)
http://dx.doi.org/10.1364/AO.45.000851
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Abstract
We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.
© 2006 Optical Society of America
OCIS Codes
(090.1000) Holography : Aberration compensation
(090.1760) Holography : Computer holography
(120.3620) Instrumentation, measurement, and metrology : Lens system design
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(180.0180) Microscopy : Microscopy
ToC Category:
Digital/Electronic Holographic Microscopy
History
Original Manuscript: May 16, 2005
Revised Manuscript: August 11, 2005
Manuscript Accepted: August 17, 2005
Virtual Issues
Vol. 1, Iss. 3 Virtual Journal for Biomedical Optics
Citation
Tristan Colomb, Etienne Cuche, Florian Charrière, Jonas Kühn, Nicolas Aspert, Frédéric Montfort, Pierre Marquet, and Christian Depeursinge, "Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation," Appl. Opt. 45, 851-863 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-5-851
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References
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