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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1359–1363

Design and deposition of vacuum-ultraviolet narrow-bandpass filters for analytical chemistry applications

Minghong Yang, Alexandre Gatto, and Norbert Kaiser  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1359-1363 (2006)
http://dx.doi.org/10.1364/AO.45.001359


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Abstract

Vacuum-ultraviolet (VUV) narrow-bandpass filters with central wavelengths at 177.5, 180.7, and 193 nm are necessary for analytical chemistry applications and for atomic emission spectrum separation. The emission spectra are so close that the required passbands of these filters are 1 to 2 nm with a maximum of 2 nm . We first investigated the designs based on the Fabry–Perot model with fluoride materials and second the deposition of narrow-bandpass filter components by using evaporation deposition. VUV spectral characterizations show that the filter components meet the requirements for analytical chemistry applications.

© 2006 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Filters/Stress

History
Original Manuscript: February 28, 2005
Revised Manuscript: August 18, 2005
Manuscript Accepted: August 24, 2005

Citation
Minghong Yang, Alexandre Gatto, and Norbert Kaiser, "Design and deposition of vacuum-ultraviolet narrow-bandpass filters for analytical chemistry applications," Appl. Opt. 45, 1359-1363 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1359

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