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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1364–1367

Ultra-low-stress thin-film interference filters

Georg J. Ockenfuss and Robert E. Klinger  »View Author Affiliations

Applied Optics, Vol. 45, Issue 7, pp. 1364-1367 (2006)

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A method to reduce the optical degrading effect of coating stress in a thin-film filter by releasing the filter from the substrate on which it was deposited is described. An extremely challenging 8-skip-0 100 GHz wavelength-division-multiplexing band-splitting filter is demonstrated.

© 2006 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

ToC Category:

Original Manuscript: February 18, 2005
Revised Manuscript: June 13, 2005
Manuscript Accepted: July 11, 2005

Georg J. Ockenfuss and Robert E. Klinger, "Ultra-low-stress thin-film interference filters," Appl. Opt. 45, 1364-1367 (2006)

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  1. N. A. O'Brien, M. J. Cumbo, K. D. Hendrix, R. B. Sargent, and M. K. Tilsch, 'Recent advances in thin film interference filters for telecommunications,' in SVC 2001, 44th Technical Conference Proceedings, (Society of Vacuum Coaters, New Mexico, 2001), pp. 255-2601.
  2. G. J. Ockenfuss, N. A. O'Brien, and E. Williams, 'Ultra-low stress coating process: an enabling technology for extreme performance thin film interference filters,' in Optical Fiber Communication Conference (OFC), Postconference Digest, Vol. 70 of OSA Trends in Optics and Photonics Series (Optical Society of America, 2002), postdeadline paper FA8. [CrossRef]
  3. S. L. Prins, A. C. Barron, W. C. Herrmann, and J. R. McNeil, 'Effect of stress on performance of dense wavelength division multiplexing filters: optical properties,' Appl. Opt. 43, 626-632 (2004). [CrossRef] [PubMed]
  4. G. J. Ockenfuss and R. E. Klinger, 'Stress free thermally stabilized dielectric optical filters,' European patent EP1,262,803 (4 December 2002).
  5. H. Takahashi, 'Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition,' Appl. Opt. 34, 667-675 (1995). [CrossRef]

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