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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1364–1367

Ultra-low-stress thin-film interference filters

Georg J. Ockenfuss and Robert E. Klinger  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1364-1367 (2006)
http://dx.doi.org/10.1364/AO.45.001364


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Abstract

A method to reduce the optical degrading effect of coating stress in a thin-film filter by releasing the filter from the substrate on which it was deposited is described. An extremely challenging 8-skip-0 100 GHz wavelength-division-multiplexing band-splitting filter is demonstrated.

© 2006 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Filters/Stress

History
Original Manuscript: February 18, 2005
Revised Manuscript: June 13, 2005
Manuscript Accepted: July 11, 2005

Citation
Georg J. Ockenfuss and Robert E. Klinger, "Ultra-low-stress thin-film interference filters," Appl. Opt. 45, 1364-1367 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1364

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