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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1368–1374

Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations

Applied Optics, Vol. 45, Issue 7, pp. 1368-1374 (2006)

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MgF 2 and GdF 3 materials, used for a single-layer coating at 193   nm , are deposited by a resistive-heating boat at specific substrate temperatures. Optical characteristics (transmittance, refractive index, extinction coefficient, and optical loss) and microstructures (morphology and crystalline structure) are investigated and discussed. Furthermore, MgF2 is used as a low-index material, and GdF3 is used as a high-index material for multilayer coatings. Reflectance, stress, and the laser-induced damage threshold (LIDT) are studied. It is shown that MgF2 and GdF3 thin films, deposited on the substrate at a temperature of 300 ° C , obtain good quality thin films with high transmittance and little optical loss at 193   nm . For multilayer coatings, the stress mainly comes from MgF2, and the absorption comes from GdF3. Among those coatings, the sixteen-layer design, sub / ( 1.4 L   0.6 H ) 8 ∕air, shows the largest LIDT.

© 2006 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Short and Intense Wavelength Coatings

Original Manuscript: January 5, 2005
Manuscript Accepted: June 28, 2005

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat," Appl. Opt. 45, 1368-1374 (2006)

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