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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1368–1374

Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1368-1374 (2006)
http://dx.doi.org/10.1364/AO.45.001368


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Abstract

MgF 2 and GdF 3 materials, used for a single-layer coating at 193   nm , are deposited by a resistive-heating boat at specific substrate temperatures. Optical characteristics (transmittance, refractive index, extinction coefficient, and optical loss) and microstructures (morphology and crystalline structure) are investigated and discussed. Furthermore, MgF2 is used as a low-index material, and GdF3 is used as a high-index material for multilayer coatings. Reflectance, stress, and the laser-induced damage threshold (LIDT) are studied. It is shown that MgF2 and GdF3 thin films, deposited on the substrate at a temperature of 300 ° C , obtain good quality thin films with high transmittance and little optical loss at 193   nm . For multilayer coatings, the stress mainly comes from MgF2, and the absorption comes from GdF3. Among those coatings, the sixteen-layer design, sub / ( 1.4 L   0.6 H ) 8 ∕air, shows the largest LIDT.

© 2006 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Short and Intense Wavelength Coatings

History
Original Manuscript: January 5, 2005
Manuscript Accepted: June 28, 2005

Citation
Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat," Appl. Opt. 45, 1368-1374 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1368


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References

  1. F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Carniglia, T. T. Hart, and T. L. Lichtenstein, 'Materials for optical coatings in the ultraviolet,' Appl. Opt. 24, 496-500 (1985). [CrossRef] [PubMed]
  2. Y. Uchida, R. Kato, and E. Matsui, 'Optical properties of some solids in the vacuum ultraviolet,' J. Quantum Spectrosc. 2, 589-598 (1962). [CrossRef]
  3. S. Güster, D. Ristau, and S. Bosch, 'Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films,' Proc. SPIE 4099, 299-310 (2001). [CrossRef]
  4. M. Zukic, D. G. Torr, J. F. Spann, and M. R. Torr, 'Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films,' Appl. Opt. 29, 4284-4292 (1990). [CrossRef] [PubMed]
  5. S. Niisaka, T. Saito, J. Saito, A. Tanaka, A. Matsumoto, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, and K. Sone, 'Development of optical coatings for 157-nm lithography. 1. Coating materials,' Appl. Opt. 41, 3242-3247 (2002). [CrossRef] [PubMed]
  6. Y. Taki, 'Structures and optical constants of magnetron-sputtered fluoride coatings for deep ultraviolet lithography,' presented at the 7th International Symposium on Sputtering and Plasma Processes, Kanazawa, Japan, 11-13 June, 2003.
  7. D. Ristau, S. Günster, S. Bosch, A. Duparré, E. Masetti, J. Ferré-Borrull, G. Kiriakidis, F. Peirò, E. Quesnel, and A. Tikhonravov, 'Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation,' Appl. Opt. 41, 3196-3204 (2002). [CrossRef] [PubMed]
  8. E. Quesnel, L. Dumas, D. Jacob, and F. Peiro, 'Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process,' J. Vac. Sci. Technol. A 18, 2869-2876 (2000). [CrossRef]
  9. J. Y. Robic, V. Muffato, P. Chaton, M. Ida, and M. Berger, 'Optical and structural properties of YF3 thin films prepared by ion assisted deposition or ion beam sputtering techniques,' Proc. SPIE 2253, 195-203 (1994). [CrossRef]
  10. J. G. Cook, G. H. Yousefi, S. R. Das, and D. F. Mitchell, 'R.F. magnetron deposition of calcium fluoride,' Thin Solid Films 217, 87-90 (1992). [CrossRef]
  11. O. Paredes, C. Córdoba, and J. Benavides, 'Optical constants determination in thin films lead-free vitreous coatings,' Superficies Vaco 9, 89-91 (1999).
  12. B. A. Movchan and A. V. Demshichin, 'Study of the structure and properties of the vacuum condensation of nickel, titanium, tungsten, aluminium oxide, and zirconium dioxide,' Fiz. Met. Metall. 28, 653 (1969).
  13. J. A. Thornton, 'Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings,' J. Vac. Sci. Technol. 11, 666-670 (1974).
  14. R. Messier, A. P. Giri, and R. A. Roy, 'Revised structure zone model for thin physical structure,' J. Vac. Sci. Technol. A 2, 500-503 (1984). [CrossRef]
  15. U. Kaiser, N. Kaiser, P. Weibetabrodt, U. Mademann, E. Hacker, and H. Müller, 'Structure of thin fluoride films deposited on amorphous substrates,' Thin Solid Films 217, 7-10 (1992). [CrossRef]
  16. U. Kaiser, M. Adamik, G. Safran, P. B. Barna, S. Laux, and W. Richter, 'Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates,' Thin Solid Films 280, 5-15 (1996). [CrossRef]

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