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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1386–1391

Optics InfoBase > Applied Optics > Volume 45 > Issue 7 > Page 1386

Dedicated spectrophotometer for localized transmittance and reflectance measurements

Laëtitia Abel-Tiberini, Frédéric Lemarquis, and Michel Lequime  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1386-1391 (2006)
http://dx.doi.org/10.1364/AO.45.001386


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Abstract

A dedicated spectrophotometer is built to achieve localized transmittance and reflectance measurements. The spatial resolution can be chosen from 100   μ m   to   2   mm , the spectral resolution from 0.5   to   5   nm , and the spectral range from 400   to   1700   nm . This apparatus can be used to study the index and thickness uniformity on single layers to determine and optimize the characteristics of the deposition chamber. It can also be used to measure the spatial variations of optical properties of intended nonuniform coatings such as linear variable filters.

© 2006 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Characterization of Optical Coatings

History
Original Manuscript: February 28, 2005
Revised Manuscript: July 27, 2005
Manuscript Accepted: August 10, 2005

Citation
Laëtitia Abel-Tiberini, Frédéric Lemarquis, and Michel Lequime, "Dedicated spectrophotometer for localized transmittance and reflectance measurements," Appl. Opt. 45, 1386-1391 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1386

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