High-resolution photothermal microscope: a sensitive tool for the detection of isolated absorbing defects in optical coatings
Applied Optics, Vol. 45, Issue 7, pp. 1410-1415 (2006)
http://dx.doi.org/10.1364/AO.45.001410
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Abstract
The photothermal deflection technique allows us to highlight the presence of inhomogeneities of absorption in optical components. This nondestructive tool is of great interest to the study of the role of contaminants, inclusions, and impurities in the laser-induced damage process. We show that the detection of nanometer-sized isolated absorbing defects requires the development of an adapted photothermal setup with high detectivity and high spatial resolution. Thus it is essential to improve the resolving power up to its theoretical limit.
© 2006 Optical Society of America
OCIS Codes
(110.0180) Imaging systems : Microscopy
(300.1030) Spectroscopy : Absorption
(350.5340) Other areas of optics : Photothermal effects
(350.5730) Other areas of optics : Resolution
ToC Category:
Characterization of Optical Coatings
History
Original Manuscript: March 1, 2005
Manuscript Accepted: July 28, 2005
Virtual Issues
Vol. 1, Iss. 4 Virtual Journal for Biomedical Optics
Citation
Bertrand Bertussi, Jean-Yves Natoli, and Mireille Commandré, "High-resolution photothermal microscope: a sensitive tool for the detection of isolated absorbing defects in optical coatings," Appl. Opt. 45, 1410-1415 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1410
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