Effects of substrate and deposition method onto the mirror scattering
Applied Optics, Vol. 45, Issue 7, pp. 1440-1446 (2006)
http://dx.doi.org/10.1364/AO.45.001440
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Abstract
The effect of surface roughness onto the mirror scattering has been studied.
Five kinds of substrates with different surface roughness were fabricated. On those substrates, dielectric multilayer coating for high reflectivity was deposited by ion-beam sputtering (IBS) and by electron-beam (EB) evaporation. Total integrated scattering (TIS)
measurement setup was built for the evaluation of deposited samples. Most of the IBS mirrors showed lower scattering than the EB mirrors, which were deposited on the similar substrates in surface roughness. The ratio of substrate TIS to mirror TIS was defined for evaluation. It increased abruptly at approximately 2Å in surface roughness,
which indicated that to make low-loss mirrors, the substrate roughness should be less than
© 2006 Optical Society of America
OCIS Codes
(290.5820) Scattering : Scattering measurements
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
ToC Category:
Deposition of Optical Coatings
History
Original Manuscript: February 28, 2005
Manuscript Accepted: June 28, 2005
Citation
Hyun-Ju Cho, Myung-Jin Shin, and Jae-Cheul Lee, "Effects of substrate and deposition method onto the mirror scattering," Appl. Opt. 45, 1440-1446 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1440
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