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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1456–1460

Improved rate control for electron-beam evaporation and evaluation of optical performance improvements

Michael Gevelber, Bing Xu, and Douglas Smith  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1456-1460 (2006)
http://dx.doi.org/10.1364/AO.45.001456


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Abstract

A new deposition-rate-control and electron-beam-gun (e-gun) strategy was developed that significantly reduces the growth-rate variations for e-beam-deposited SiO 2 coatings. The resulting improvements in optical performance are evaluated for multilayer bandpass filters. The adverse effect of uneven silica-source depletion on coating spectral performances during long deposition runs is discussed.

© 2006 Optical Society of America

OCIS Codes
(160.6030) Materials : Silica
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Deposition of Optical Coatings

History
Original Manuscript: March 21, 2005
Manuscript Accepted: July 7, 2005

Citation
Michael Gevelber, Bing Xu, and Douglas Smith, "Improved rate control for electron-beam evaporation and evaluation of optical performance improvements," Appl. Opt. 45, 1456-1460 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1456

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