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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 7 — Mar. 1, 2006
  • pp: 1461–1464

Ion-assisted deposition of TiO2∕SiO2 multilayers for mass production

Bin Fan, Masahiro Suzuki, and Ken Tang  »View Author Affiliations


Applied Optics, Vol. 45, Issue 7, pp. 1461-1464 (2006)
http://dx.doi.org/10.1364/AO.45.001461


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Abstract

The optical and microstructural properties of filters composed of TiO 2   and   SiO 2 multilayers deposited by different ion-assisted-deposition (IAD) parameters were investigated. The proper IAD coating conditions for mass-produced, environmentally stable, low-scattering, and low-absorption TiO 2 / SiO 2 multilayers were obtained after comparison of these filters.

© 2006 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Deposition of Optical Coatings

History
Original Manuscript: February 28, 2005
Manuscript Accepted: June 28, 2005

Citation
Bin Fan, Masahiro Suzuki, and Ken Tang, "Ion-assisted deposition of TiO2/SiO2 multilayers for mass production," Appl. Opt. 45, 1461-1464 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1461

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