Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality
Applied Optics, Vol. 45, Issue 7, pp. 1640-1649 (2006)
http://dx.doi.org/10.1364/AO.45.001640
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Abstract
Specular ellipsometry is a well-known and efficient technique to characterize surfaces and coatings. This technique has been extended to the measurement of scattered light. We present an experimental setup, using a polarization modulator, which permits us to characterize transition layers and roughness without a calibration procedure. Experimental results are presented concerning transition layers for damage threshold applications and for rough surfaces or bulks.
© 2006 Optical Society of America
OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.0240) Optics at surfaces : Optics at surfaces
(240.5770) Optics at surfaces : Roughness
ToC Category:
Optical Interference Coatings
History
Original Manuscript: March 2, 2005
Revised Manuscript: July 25, 2005
Manuscript Accepted: August 13, 2005
Citation
Carole Deumié, Oliver Gilbert, Gaelle Georges, Laurent Arnaud, and Claude Amra, "Ellipsometry of reflected and scattered fields for the analysis of substrate optical quality," Appl. Opt. 45, 1640-1649 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-7-1640
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