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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 8 — Mar. 10, 2006
  • pp: 1721–1724

Optical properties of fluids for 248 and 193 nm immersion photolithography

Simon G. Kaplan and John H. Burnett  »View Author Affiliations


Applied Optics, Vol. 45, Issue 8, pp. 1721-1724 (2006)
http://dx.doi.org/10.1364/AO.45.001721


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Abstract

We present measured values of the refractive index, thermo-optic coefficient, and absorption coefficient of a number of common organic solvents and aqueous inorganic solutions that may have application in immersion photolithography at 248 or 193   nm wavelengths. The measurements were performed with a laser-based Hilger–Chance refractometer system whose design and operation are described. The optical properties of the sample fluids are compared with those of water, the currently favored immersion medium, and we discuss the potential for finding higher-index fluids that will be suitable for this application.

© 2006 Optical Society of America

OCIS Codes
(120.5710) Instrumentation, measurement, and metrology : Refraction
(160.4670) Materials : Optical materials

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: June 13, 2005
Revised Manuscript: September 20, 2005
Manuscript Accepted: September 21, 2005

Citation
Simon G. Kaplan and John H. Burnett, "Optical properties of fluids for 248 and 193 nm immersion photolithography," Appl. Opt. 45, 1721-1724 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-8-1721

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