Abstract
Titanium oxide thin films were deposited by electron-beam evaporation with ion-beam-assisted deposition. The effect of the substrate temperature and annealing temperature on the columnar microstructure and recrystallization of titanium oxide was studied. The values of the refractive index varied from 2.26 to 2.4, indicating that the different substrate temperatures affected the film density. X-ray diffraction revealed that all films were amorphous as deposited. At annealing temperatures from , only the anatase phase was formed. As the substrate temperature increased from , the recrystallization temperature fell from through . Changing the substrate temperature resulted in the formation of various types of columnar microstructure, as determined by scanning-electron microscopy. Different columnar structures resulted in different surface morphologies, as measured by atomic-force microscopy.
© 2006 Optical Society of America
Full Article | PDF ArticleMore Like This
Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 45(13) 3091-3096 (2006)
Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 44(15) 2996-3000 (2005)
Seouk-Hoon Woo and Chang Kwon Hwangbo
Appl. Opt. 45(7) 1447-1455 (2006)