Titanium oxide thin films were deposited by electron-beam evaporation with ion-beam-assisted deposition.
The effect of the substrate temperature and annealing temperature on the columnar microstructure and recrystallization of titanium oxide was studied. The values of the refractive index varied from 2.26 to 2.4, indicating that the different substrate temperatures affected the film density. X-ray diffraction revealed that all films were amorphous as deposited. At annealing temperatures from
© 2006 Optical Society of America
Original Manuscript: March 15, 2005
Manuscript Accepted: October 10, 2005
Hsi-Chao Chen, Cheng-Chung Lee, Cheng-Chung Jaing, Ming-Hua Shiao, Chih-Jung Lu, and Fuh-Sheng Shieu, "Effects of temperature on columnar microstructure and recrystallization of TiO2 film produced by ion-assisted deposition," Appl. Opt. 45, 1979-1984 (2006)