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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 9 — Mar. 20, 2006
  • pp: 1985–1992

Polarization and higher-order content measurement of a soft-x-ray monochromatized beam with Mo–Si multilayers

Maria-Guglielmina Pelizzo, F. Frassetto, P. Nicolosi, A. Giglia, N. Mahne, and S. Nannarone  »View Author Affiliations


Applied Optics, Vol. 45, Issue 9, pp. 1985-1992 (2006)
http://dx.doi.org/10.1364/AO.45.001985


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Abstract

A Mo–Si multilayer mirror has been used for determination of the ellipticity and higher-order content of a synchrotron beam. The method is based on the angular measure of multilayer reflectivity in the region of Bragg first- and second-order reflections. Beam parameters were derived by a fitting procedure.

© 2006 Optical Society of America

OCIS Codes
(120.4140) Instrumentation, measurement, and metrology : Monochromators
(310.6860) Thin films : Thin films, optical properties
(340.6720) X-ray optics : Synchrotron radiation

ToC Category:
Thin Films

History
Original Manuscript: May 16, 2005
Revised Manuscript: September 19, 2005
Manuscript Accepted: September 23, 2005

Citation
Maria-Guglielmina Pelizzo, F. Frassetto, P. Nicolosi, A. Giglia, N. Mahne, and S. Nannarone, "Polarization and higher-order content measurement of a soft-x-ray monochromatized beam with Mo-Si multilayers," Appl. Opt. 45, 1985-1992 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-9-1985

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