OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 9 — Mar. 20, 2006
  • pp: 1985–1992

Polarization and higher-order content measurement of a soft-x-ray monochromatized beam with Mo–Si multilayers

Maria-Guglielmina Pelizzo, F. Frassetto, P. Nicolosi, A. Giglia, N. Mahne, and S. Nannarone  »View Author Affiliations


Applied Optics, Vol. 45, Issue 9, pp. 1985-1992 (2006)
http://dx.doi.org/10.1364/AO.45.001985


View Full Text Article

Enhanced HTML    Acrobat PDF (553 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

A Mo–Si multilayer mirror has been used for determination of the ellipticity and higher-order content of a synchrotron beam. The method is based on the angular measure of multilayer reflectivity in the region of Bragg first- and second-order reflections. Beam parameters were derived by a fitting procedure.

© 2006 Optical Society of America

OCIS Codes
(120.4140) Instrumentation, measurement, and metrology : Monochromators
(310.6860) Thin films : Thin films, optical properties
(340.6720) X-ray optics : Synchrotron radiation

ToC Category:
Thin Films

History
Original Manuscript: May 16, 2005
Revised Manuscript: September 19, 2005
Manuscript Accepted: September 23, 2005

Citation
Maria-Guglielmina Pelizzo, F. Frassetto, P. Nicolosi, A. Giglia, N. Mahne, and S. Nannarone, "Polarization and higher-order content measurement of a soft-x-ray monochromatized beam with Mo-Si multilayers," Appl. Opt. 45, 1985-1992 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-9-1985


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. E Spiller, Soft X-Ray Optics (SPIE Press, 1994). [CrossRef]
  2. E. D. Palik, ed., Handbook of Optical Constants of Solids (Academic, 1985).
  3. M. Yamamoto and T. Namioka, "Layer-by-layer design method for soft x-ray multilayers," Appl. Opt. 31, 1622-1630 (1992). [CrossRef] [PubMed]
  4. J. Larruquert, "New layer-by-layer method multilayer design method," J. Opt. Soc. Am. A 19, 385-390 (2002). [CrossRef]
  5. S. Di Fonzo, W. Jark, F. Schäfers, H. Petersen, A. Gaupp, and J. H. Underwood, "Phase retardation and full-polarization analysis of soft-x-ray synchrotron radiation close to the carbon K edge by use of a multilayer transmission filter," Appl. Opt. 33, 2624-2632 (1994). [CrossRef]
  6. H. Kimura, M. Yamamoto, M. Yanagihara, T. Maehara, and T. Namioka, "Full polarization measurement of synchrotron radiation with use of soft x-ray multilayers," Rev. Sci. Instrum. 63, 1379-1382, (1992). [CrossRef]
  7. F. Schäfers, H.-Ch. Mertins, A. Gaupp, W. Gudat, M. Mertin, I. Packe, F. Schmolla, S. Di Fonzo, G. Soullié, W. Jark, R. Walker, X. Le Cann, R. Nyholm, and M. Eriksson, "Soft-x-ray polarimeter with multilayer optics: complete analysis of the polarization state of light," Appl. Opt. 38, 4074-4088 (1999). [CrossRef]
  8. Y. Saitoh, H. Kimura, Y. Suzuki, T. Nakatani, T. Matsushita, T. Muro, T. Miyahara, M. Fujisawa, K. Soda, S. Ueda, H. Harada, M. Kotsugi, A. Sekiyama, and S. Suga, "Performance of a very high resolution soft x-ray beamline BL25SU with a twin-helical undulator at Spring-8," Rev. Sci. Instrum. 71, 3254-3259 (2000). [CrossRef]
  9. G. Naletto, M. G. Pelizzo, G. Tondello, S. Nannarone, and A. Giglia, "The monochromator for the synchrotron radiation beamline X-MOSS at ELETTRA," in Advances in X-Ray Optics, A. Freund, T. Ishikawa, A. M. Khounsary, D. C. Mancini, A. G. Michette, and S. Oestreich eds.; SPIE Proc. Vol. 4145, 105-109, (2001). [CrossRef]
  10. S. Nannarone, F. Borgatti, A. DeLuisa, B. P. Doyle, G. C. Gazzadi, A. Giglia, P. Finetti, N. Mahne, L. Pasquali, M. Pedio, G. Selvaggi, G. Naletto, M. G. Pelizzo, and G. Tondello, "The BEAR beamline at ELETTRA," AIP Conf. Proc. 705 (2004), p. 450; http://new.tasc.infm.it/research/bear/.
  11. L. Pasquali, A. De Luisa, and S. Nannarone, "The UHV experimental chamber for optical measurements (reflectivity and absorption) and angle resolved photoemission of the BEAR beamline at ELETTRA," AIP Conf. Proc. 705 (2004), p. 1142.
  12. V. Rigato, A. Patelli, G. Maggioni, G. Salmaso, V. Mattarello, M. G. Pelizzo, P. Nicolosi, L. Depero, E. Bontempi, and P. Mazzoldi, "Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si:H multilayers for EUV applications," Surf. Coat. Technol. 174-175, 40-48 (2003) [CrossRef]
  13. M. G. Pelizzo, D. Garoli, P. Nicolosi, A. Patelli, and V. Rigato, "Design, deposition and characterization of multilayer coatings for the ultraviolet and visible-light coronagraphic imager," Appl. Opt. 43, 2661-2669 (2004). [CrossRef] [PubMed]
  14. D. L. Windt, "IMD-software for modeling the optical properties of multilayer films," Comp. Phys. 12, 360-370 (1998). [CrossRef]
  15. Absolute XUV silicon photodiode, AXUV series (International Radiation Detectors, Torrance, Calif. http://www.ird-inc.com).
  16. C. N. Berglund and W. E. Spicer, "Photoemission studies of copper and silver: theory and experiment," Phys. Rev. 136, A 1030 (1964).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited