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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 9 — Mar. 20, 2006
  • pp: 2001–2013

Radial mask for imaging systems that exhibit high resolution and extended depths of field

Eyal Ben-Eliezer, Emanuel Marom, Naim Konforti, and Zeev Zalevsky  »View Author Affiliations


Applied Optics, Vol. 45, Issue 9, pp. 2001-2013 (2006)
http://dx.doi.org/10.1364/AO.45.002001


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Abstract

A novel algorithm for the design of an imaging system that exhibits high resolution as well as extended depth of field is presented. This novel approach searches for an optimal pupil mask that minimizes the value of the mean-square error when performed over the intensity rather than in the field distribution of the acquired image. The captured images in such system do not require any postprocessing, and thus utilization of such a system is simplified. Simulations as well as experimental results are provided.

© 2006 Optical Society of America

OCIS Codes
(080.1010) Geometric optics : Aberrations (global)
(080.3620) Geometric optics : Lens system design
(110.0110) Imaging systems : Imaging systems

History
Original Manuscript: June 6, 2005
Revised Manuscript: October 10, 2005
Manuscript Accepted: October 11, 2005

Citation
Eyal Ben-Eliezer, Emanuel Marom, Naim Konforti, and Zeev Zalevsky, "Radial mask for imaging systems that exhibit high resolution and extended depths of field," Appl. Opt. 45, 2001-2013 (2006)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-45-9-2001


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