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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 11 — Apr. 10, 2007
  • pp: 2027–2035

Interferometric measurement of phase change on reflection

Kate M. Medicus, Marcus Chaney, John E. Brodziak, Jr., and Angela Davies  »View Author Affiliations


Applied Optics, Vol. 46, Issue 11, pp. 2027-2035 (2007)
http://dx.doi.org/10.1364/AO.46.002027


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Abstract

We show an interferometric method for measuring phase change with known uncertainty. Because this measurement uses the backreflection from a sample, the height is intrinsically removed, and only the phase change is measured. The uncertainty in the phase change measurement is ± 3.8 ° and is dominated by the background subtraction method. We also investigate the effect of the phase change on the interferometric radius measurement. The theoretical worst-case error in the interferometric radius measurement due to the phase change is 30   nm .

© 2007 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.5700) Instrumentation, measurement, and metrology : Reflection

ToC Category:
Interferometry

History
Original Manuscript: August 30, 2006
Revised Manuscript: November 14, 2006
Manuscript Accepted: November 28, 2006
Published: March 20, 2007

Citation
Kate M. Medicus, Marcus Chaney, John E. Brodziak, Jr., and Angela Davies, "Interferometric measurement of phase change on reflection," Appl. Opt. 46, 2027-2035 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-11-2027


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