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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 11 — Apr. 10, 2007
  • pp: 2084–2090

Elimination of cumulative effect of thickness errors in monochromatic monitoring of optical coating production: theory

A. V. Tikhonravov and M. K. Trubetskov  »View Author Affiliations


Applied Optics, Vol. 46, Issue 11, pp. 2084-2090 (2007)
http://dx.doi.org/10.1364/AO.46.002084


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Abstract

We propose an algorithm for correcting deposition termination levels that allows elimination of the cumulative effect of errors in previously deposited layers. For the application of this algorithm at least one monitoring signal extremum should be registered during a layer deposition. We also derive a theoretical relation for the estimation of errors in layer refractive indices based on the results of on-line monitoring measurements. At least two monitoring signal extrema are required for its application.

© 2007 Optical Society of America

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Thin Films

History
Original Manuscript: September 15, 2006
Manuscript Accepted: November 22, 2006
Published: March 20, 2007

Citation
A. V. Tikhonravov and M. K. Trubetskov, "Elimination of cumulative effect of thickness errors in monochromatic monitoring of optical coating production: theory," Appl. Opt. 46, 2084-2090 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-11-2084

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