Analysis of multimask fabrication errors for diffractive optical elements
Applied Optics, Vol. 46, Issue 12, pp. 2180-2188 (2007)
http://dx.doi.org/10.1364/AO.46.002180
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Abstract
As design algorithms for diffractive optical elements improve, the limiting factor becomes the fabrication process. It is hoped a better understanding of fabrication errors will allow elements with greater tolerance to be designed.
This is important for high-power laser fiber coupling, where hot spots lead to failure. We model seven different fan-out gratings applying misetch, misalignment, and feature rounding. Our main findings are that misetch can lead to improved results, misalignment is strongly asymmetric,
and both the π and
© 2007 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.1970) Holography : Diffractive optics
(110.3960) Imaging systems : Microlithography
ToC Category:
Diffraction and Gratings
History
Original Manuscript: August 10, 2006
Revised Manuscript: November 17, 2006
Manuscript Accepted: December 1, 2006
Published: April 3, 2007
Citation
Adam J. Caley, Markus Braun, Andrew J. Waddie, and Mohammad R. Taghizadeh, "Analysis of multimask fabrication errors for diffractive optical elements," Appl. Opt. 46, 2180-2188 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-12-2180
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