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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 12 — Apr. 20, 2007
  • pp: 2180–2188

Analysis of multimask fabrication errors for diffractive optical elements

Adam J. Caley, Markus Braun, Andrew J. Waddie, and Mohammad R. Taghizadeh  »View Author Affiliations

Applied Optics, Vol. 46, Issue 12, pp. 2180-2188 (2007)

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As design algorithms for diffractive optical elements improve, the limiting factor becomes the fabrication process. It is hoped a better understanding of fabrication errors will allow elements with greater tolerance to be designed. This is important for high-power laser fiber coupling, where hot spots lead to failure. We model seven different fan-out gratings applying misetch, misalignment, and feature rounding. Our main findings are that misetch can lead to improved results, misalignment is strongly asymmetric, and both the π and π / 2 masks can dominate misalignment. Rounding has a r 2 dependence and potentially can be incorporated into the design stage. Finally we present some experimental data for misalignment.

© 2007 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.1970) Holography : Diffractive optics
(110.3960) Imaging systems : Microlithography

ToC Category:
Diffraction and Gratings

Original Manuscript: August 10, 2006
Revised Manuscript: November 17, 2006
Manuscript Accepted: December 1, 2006
Published: April 3, 2007

Adam J. Caley, Markus Braun, Andrew J. Waddie, and Mohammad R. Taghizadeh, "Analysis of multimask fabrication errors for diffractive optical elements," Appl. Opt. 46, 2180-2188 (2007)

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