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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 14 — May. 10, 2007
  • pp: 2581–2585

Design and fabrication of a high-efficiency extreme-ultraviolet binary phase-only computer-generated hologram

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, and J. Alexander Liddle  »View Author Affiliations

Applied Optics, Vol. 46, Issue 14, pp. 2581-2585 (2007)

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As the development of extreme-ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, make it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills. The fabrication and characterization of an EUV binary phase-only computer-generated hologram is demonstrated, allowing arbitrary far-field diffraction patterns to be generated. Based on reflective architecture, the fabricated device is extremely efficient. Based on an identically fabricated null hologram, the absolute efficiency into one diffracted order of 22% has been demonstrated. In the case where axially symmetric diffraction patterns are desired (both positive and negative diffraction orders can be used), the efficiency can be twice as high.

© 2007 Optical Society of America

OCIS Codes
(090.2890) Holography : Holographic optical elements
(260.7200) Physical optics : Ultraviolet, extreme

ToC Category:

Original Manuscript: November 9, 2006
Manuscript Accepted: December 20, 2006
Published: April 23, 2007

Patrick P. Naulleau, Farhad Salmassi, Eric M. Gullikson, and J. Alexander Liddle, "Design and fabrication of a high-efficiency extreme-ultraviolet binary phase-only computer-generated hologram," Appl. Opt. 46, 2581-2585 (2007)

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  1. R. Stulen and D. Sweeney, "Extreme ultraviolet lithography," IEEE J. Quantum Electron. 35, 694-699 (1999). [CrossRef]
  2. P. Naulleau, J. Liddle, E. Anderson, E. Gullikson, P. Mirkarimi, F. Salmassi, and E. Spiller, "Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates," Opt. Commun. 229, 109-116 (2003). [CrossRef]
  3. P. Naulleau, J. Liddle, F. Salmassi, E. Anderson, and E. Gullikson, "Design, fabrication, and characterization of high-efficiency extreme ultraviolet diffusers," Appl. Opt. 43, 5323-5329 (2004). [CrossRef] [PubMed]
  4. K. Kamon, T. Miyamoto, Y. Myoi, H. Nagata, M. Tanaka, and K. Horie, "Photolithography system using annular illumination," Jpn. J. Appl. Phys. 30, 3021-3029 (1991). [CrossRef]
  5. M. Himel, R. Hutchins, J. Colvin, M. Poutous, A. Kathman, and A. Fedor, "Design and fabrication of customized illumination patterns for low k1 lithography: a diffractive approach," in Proc. SPIE 4346, 1436-1442 (2001).
  6. P. Naulleau, C. Cho, E. Gullikson, and J. Bokor, "Transmission phase gratings for EUV interferometry," J. Synchrotron Radiat. 7, 405-410 (2000). [CrossRef]
  7. M. P. Kowalski, R. G. Cruddace, J. F. Seely, J. C. Rife, K. F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, and W. R. Hunter, "Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5-16.0 nm wavelength region," Opt. Lett. 22, 834-836 (1997).
  8. J. F. Seely, M. P. Kowalski, R. G. Cruddace, K. F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osteried, D. Menke, J. C. Rife, and W. R. Hunter, "Multilayer-coated laminar grating with 16% normal-incidence efficiency in the 150 Å wavelength region," Appl. Opt. 36, 8206-8213 (1997). [CrossRef]
  9. C. Montcalm, S. Bajt, and J. F. Seely, "MoRu-Be multilayer-coated grating with 10.4% normal-incidence efficiency near the 11.4 nm wavelength," Opt. Lett. 26, 125-127 (2001). [CrossRef]
  10. P. Naulleau, E. Anderson, E. Gullikson, and J. Bokor, "Fabrication of high-efficiency multilayer-coated binary blazed gratings in the EUV regime," Opt. Commun. 200, 27-34 (2001). [CrossRef]
  11. F. Salmassi, P. P. Naulleau, E. M. Gullikson, D. L. Olynick, and J. A. Liddle, "Extreme ultraviolet binary phase gratings: fabrication and application to diffractive optics," J. Vac. Sci. Technol. A 24, 1136-1140 (2006). [CrossRef]
  12. R. Gerchberg and W. Saxon, "A practical algorithm for the determination of phase from image and diffraction plane pictures," Optik (Stuttgart) 35, 237-246 (1972).
  13. J. Fienup, "Reconstruction of an object from the modulus of its Fourier transform," Opt. Lett. 3, 27-29 (1978). [CrossRef] [PubMed]
  14. J. H. Underwood, E. M. Gullikson, M. Koike, P. J. Batson, P. E. Denham, K. D. Franck, R. E. Tackaberry, and W. F. Steele, "Calibration and standards beamline 6.3.2 at the advanced light source," Rev. Sci. Instrum. 67, 3372 (1996). [CrossRef]

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