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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 15 — May. 20, 2007
  • pp: 2899–2902

Design and fabrication of a novel reflection filter

Xuezheng Sun, Peifu Gu, Weidong Shen, Xu Liu, Yuan Wang, and Yueguang Zhang  »View Author Affiliations


Applied Optics, Vol. 46, Issue 15, pp. 2899-2902 (2007)
http://dx.doi.org/10.1364/AO.46.002899


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Abstract

Reflection filters are useful in optical communication, display, and other systems. A novel reflection filter is designed and fabricated. Analytical design formulas have been put forward and show good agreement with the measured maximum reflectance as well as with the bandwidth at the central wavelength. The effective admittance and distribution of the electrical field intensity are also calculated to analyze the properties of the filter. This novel filter with high peak reflectance, narrow bandwidth, and deep cutoff, is simple to design, easy to fabricate and convenient to integrate, compared with the conventional dielectric multilayer reflection filters.

© 2007 Optical Society of America

OCIS Codes
(230.0230) Optical devices : Optical devices
(310.0310) Thin films : Thin films

ToC Category:
Optical Devices

History
Original Manuscript: November 3, 2006
Manuscript Accepted: January 15, 2007
Published: May 1, 2007

Citation
Xuezheng Sun, Peifu Gu, Weidong Shen, Xu Liu, Yuan Wang, and Yueguang Zhang, "Design and fabrication of a novel reflection filter," Appl. Opt. 46, 2899-2902 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-15-2899

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