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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 18 — Jun. 20, 2007
  • pp: 3821–3828

Interferometry based technique for intensity profile measurements of far IR beams

Alexander A. Soloviev, Efim A. Khazanov, Ilya E. Kozhevatov, and Oleg V. Palashov  »View Author Affiliations

Applied Optics, Vol. 46, Issue 18, pp. 3821-3828 (2007)

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We present a novel, to the best of our knowledge, method for measuring the intensity profile of far-IR beams. The method is based on the measurements of nonstationary variation in optical thickness of a fused-silica plate heated by the studied radiation. The optical thickness is observed by means of a reflecting interferometer. Purpose-made experimental setup allows one to measure beams with an aperture of up to 60   mm with a spatial resolution of 1   mm . The accessibility of the utilized technologies and the possibility to easily increase the aperture are the major advantages of this approach. The probable area of application for the method is measurements of beams produced by powerful industrial far-IR lasers.

© 2007 Optical Society of America

OCIS Codes
(040.3060) Detectors : Infrared
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(140.6810) Lasers and laser optics : Thermal effects

ToC Category:

Original Manuscript: November 1, 2006
Revised Manuscript: February 1, 2007
Manuscript Accepted: February 3, 2007
Published: May 31, 2007

Alexander A. Soloviev, Efim A. Khazanov, Ilya E. Kozhevatov, and Oleg V. Palashov, "Interferometry based technique for intensity profile measurements of far IR beams," Appl. Opt. 46, 3821-3828 (2007)

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