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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 20 — Jul. 10, 2007
  • pp: 4248–4257

Scatterfield microscopy for extending the limits of image-based optical metrology

Richard M. Silver, Bryan M. Barnes, Ravikiran Attota, Jay Jun, Michael Stocker, Egon Marx, and Heather J. Patrick  »View Author Affiliations


Applied Optics, Vol. 46, Issue 20, pp. 4248-4257 (2007)
http://dx.doi.org/10.1364/AO.46.004248


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Abstract

We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets to extend the limits of image-based optical metrology. Previously we reported results from samples with sub- 50 -nm -sized features having pitches larger than the conventional Rayleigh resolution criterion, which resulted in images having edge contrast and elements of conventional imaging. In this paper we extend these methods to targets composed of features much denser than the conventional Rayleigh resolution criterion. For these applications, a new approach is presented that uses a combination of zero-order optical response and edge-based imaging. The approach is, however, more general and a more comprehensive set of analyses using theoretical methods is presented. This analysis gives a direct measure of the ultimate size and density of features that can be measured with these optical techniques. We present both experimental results and optical simulations using different electromagnetic scattering packages to evaluate the ultimate sensitivity and extensibility of these techniques.

© Optical Society of America

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(110.0180) Imaging systems : Microscopy
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Microscopy

History
Original Manuscript: October 25, 2006
Revised Manuscript: March 16, 2007
Manuscript Accepted: March 19, 2007
Published: June 20, 2007

Citation
Richard M. Silver, Bryan M. Barnes, Ravikiran Attota, Jay Jun, Michael Stocker, Egon Marx, and Heather J. Patrick, "Scatterfield microscopy for extending the limits of image-based optical metrology," Appl. Opt. 46, 4248-4257 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-20-4248


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References

  1. R. Attota, R. M. Silver, M. Bishop, E. Marx, J. Jun, M. Stocker, M. P. Davidson, and R. Larrabee, "Evaluation of new in-chip and arrayed line overlay target designs," Proc. SPIE 5375, 395-402 (2004). [CrossRef]
  2. J. Seligson, M. Adel, P. Izikson, V. Levinski, and D. Yaffe, "Target noise in overlay metrology," Proc. SPIE 5375, 403-412 (2004). [CrossRef]
  3. E. Solecky and J. Morillo, "Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control," Proc. SPIE 5375, 41-50 (2004). [CrossRef]
  4. R. M. Silver, R. Attota, M. Stocker, M. Bishop, L. Howard, T. Germer, E. Marx, M. Davidson, and R. Larrabee, "High-resolution optical metrology," Proc. SPIE 5752, 67-79 (2005). [CrossRef]
  5. R. M. Silver, R. Attota, M. Stocker, M. Bishop, J. Jun, E. Marx, M. Davidson, and R. Larrabee, "High-resolution optical overlay metrology," Proc. SPIE 5375, 78-95 (2004). [CrossRef]
  6. R. Attota, R. M. Silver, T. Germer, M. Bishop, R. Larrabee, M. Stocker, and L. Howard, "Application of through-focus focus-metric analysis in high resolution optical microscopy," Proc. SPIE 5752, 1441-1449 (2005). [CrossRef]
  7. R. M. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo, and M. Davidson, "Comparison of measured optical image profiles of silicon lines with two different theoretical models," Proc. SPIE 4689, 409-429 (2002). [CrossRef]
  8. M. Bishop, R. Silver, and B. Bunday, "The OMAG 3 reticle set," Tech Transfer #03074417A-ENG (International SEMATECH, 2004).
  9. C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woolam, and W. Paulson, "Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation," J. Appl. Phys. 83, 3323-3336 (1998). [CrossRef]
  10. R. M. Silver, B. Barnes, R. Attota, J. Jun, J. Filliben, J. Soto, M. Stocker, P. Lipscomb, E. Marx, H. Patrick, R. Dixson, and R. Larrabee, "The limits of image-based optical metrology," Proc. SPIE 6152, 6152OZ (2006). [CrossRef]
  11. E. Marx and J. Potzick, "Simulation of optical microscope images of photomask feature size measurements," in IEEE Antennas and Propagation Society International Symposium (IEEE, 2005), Vol. 3B, pp. 243-246.
  12. M. Davidson, B. H. Kleemann, and J. Bischoff, "A comparison between rigorous light scattering methods," Proc. SPIE 305, 606-619 (1997). [CrossRef]

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