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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 21 — Jul. 20, 2007
  • pp: 4613–4624

Analysis of systematic errors in spatial carrier phase shifting applied to interferogram intensity modulation determination

Adam Styk and Krzysztof Patorski  »View Author Affiliations

Applied Optics, Vol. 46, Issue 21, pp. 4613-4624 (2007)

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Two-beam interferogram intensity modulation decoding using spatial carrier phase shifting interferometry is discussed. Single frame recording, simplicity of experimental equipment, and uncomplicated data processing are the main advantages of the method. A comprehensive analysis of the influence of systematic errors (spatial carrier miscalibration, nonuniform average intensity profile, and nonlinear recording) on the modulation distribution determination using automatic fringe pattern analysis techniques is presented. The results of searching for the optimum calculation algorithm are described. Extensive numerical simulations are compared with laboratory findings obtained when testing vibrating silicon microelements under various experimental conditions.

© 2007 Optical Society of America

OCIS Codes
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5060) Instrumentation, measurement, and metrology : Phase modulation
(120.7280) Instrumentation, measurement, and metrology : Vibration analysis

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: February 22, 2007
Manuscript Accepted: March 26, 2007
Published: July 6, 2007

Adam Styk and Krzysztof Patorski, "Analysis of systematic errors in spatial carrier phase shifting applied to interferogram intensity modulation determination," Appl. Opt. 46, 4613-4624 (2007)

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