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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 23 — Aug. 10, 2007
  • pp: 5571–5587

Images of strips on and trenches in substrates

Egon Marx  »View Author Affiliations


Applied Optics, Vol. 46, Issue 23, pp. 5571-5587 (2007)
http://dx.doi.org/10.1364/AO.46.005571


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Abstract

The computation of images of lines or strips on a substrate and trenches in a substrate or a layer above a substrate, all made of dielectric or conducting materials, is presented. The method is based on integral equations, of the single-integral-equation kind, equivalent to Maxwell's equations and on Fourier optics. Examples of computed images illustrating some of the features found in the images are provided. Approximations involved in the model of the actual scatterer and microscope as well as in the theoretical and numerical representations are discussed.

© 2007 Optical Society of America

OCIS Codes
(000.3860) General : Mathematical methods in physics
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.0180) Imaging systems : Microscopy
(110.3960) Imaging systems : Microlithography
(290.3700) Scattering : Linewidth

ToC Category:
Scattering

History
Original Manuscript: August 11, 2006
Revised Manuscript: January 11, 2007
Manuscript Accepted: March 23, 2007
Published: August 7, 2007

Citation
Egon Marx, "Images of strips on and trenches in substrates," Appl. Opt. 46, 5571-5587 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-23-5571

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