Optical and electrical properties between 0.4 and 12 μm for Sn-doped In2O3 films by pulsed laser deposition and cathode sputtering
Applied Optics, Vol. 46, Issue 23, pp. 5709-5718 (2007)
http://dx.doi.org/10.1364/AO.46.005709
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Abstract
Optical properties of Sn-doped
© 2007 Optical Society of America
OCIS Codes
(160.6000) Materials : Semiconductor materials
(260.3060) Physical optics : Infrared
(260.3090) Physical optics : Infrared, far
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
ToC Category:
Thin Films
History
Original Manuscript: April 4, 2007
Manuscript Accepted: May 22, 2007
Published: August 8, 2007
Citation
Daniel Dubreuil, Jean-Pierre Ganne, Gérard Berginc, and Frédéric Terracher, "Optical and electrical properties between 0.4 and 12 μm for Sn-doped In2O3 films by pulsed laser deposition and cathode sputtering," Appl. Opt. 46, 5709-5718 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-23-5709
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