Direct-write patterning of indium-tin-oxide film by high pulse repetition frequency femtosecond laser ablation
Applied Optics, Vol. 46, Issue 23, pp. 5792-5799 (2007)
http://dx.doi.org/10.1364/AO.46.005792
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Abstract
Ablation of indium oxide doped with tin oxide (ITO) from glass substrates is described.
Laser pulse energy and focus spot size were varied in single-pulse, single-spot ablation tests and for ablation of linear features with scanned multiple pulses. The single-pulse ablation threshold of ITO was smaller than that of the glass substrate so the entire thickness of ITO could be removed in a single pulse or with overlying multiple pulses without the possibility of substrate ablation. Linear features could be created at much higher scanning speeds using a high repetition frequency
© 2007 Optical Society of America
OCIS Codes
(140.7090) Lasers and laser optics : Ultrafast lasers
(220.4000) Optical design and fabrication : Microstructure fabrication
ToC Category:
Lasers and Laser Optics
History
Original Manuscript: January 30, 2007
Manuscript Accepted: March 20, 2007
Published: August 10, 2007
Citation
H. W. Choi, D. F. Farson, J. Bovatsek, A. Arai, and D. Ashkenasi, "Direct-write patterning of indium-tin-oxide film by high pulse repetition frequency femtosecond laser ablation," Appl. Opt. 46, 5792-5799 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-23-5792
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