A new cost-efficient sputter-slice technology for hard x-ray \left(10–30\text{\hspace{0.17em} keV}\right) Fresnel zone plates fabrication, imposing no limitation to aspect ratio, is proposed. By means of a plasma chemical process, {\text{SiO}}_2/{\text{Si}}_{1-\mathrm{x}}{\mathrm{G}\mathrm{e}}_{\mathrm{x}}{\mathrm{O}}_2 glassy film multilayer structures are deposited on a lateral surface of a silica rod, outermost layers being as thin as 100\text{\hspace{0.17em} nm} . It has been shown by numerical simulation that for \mathit{x}=0.2 germanium fraction, 100–300\mu \text{m} zone plate thickness and the number of zones of about 1000, first order diffraction efficiency as high as 20%–30% at the energy of approximately 20 keV can be achieved.

© 2007 Optical Society of America

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