Thick, three-dimensional nanoporous density-graded materials formed by optical exposures of photopolymers with controlled levels of absorption
Applied Optics, Vol. 46, Issue 25, pp. 6350-6354 (2007)
http://dx.doi.org/10.1364/AO.46.006350
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Abstract
Three-dimensional (3D) intensity distributions generated by light passing through conformal phase masks can be modulated by the absorption property of photosensitive materials. The intensity distributions have extremely long depth of focus, which is proportional to the size of the phase masks, and this enables one to pattern thick
© 2007 Optical Society of America
OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(220.4000) Optical design and fabrication : Microstructure fabrication
(320.7110) Ultrafast optics : Ultrafast nonlinear optics
ToC Category:
Diffraction and Gratings
History
Original Manuscript: April 25, 2007
Revised Manuscript: June 5, 2007
Manuscript Accepted: June 13, 2007
Published: August 27, 2007
Virtual Issues
Vol. 2, Iss. 10 Virtual Journal for Biomedical Optics
Citation
Yun-Suk Nam, Seokwoo Jeon, Daniel Jay-Lee Shir, Alex Hamza, and John A. Rogers, "Thick, three-dimensional nanoporous density-graded materials formed by optical exposures of photopolymers with controlled levels of absorption," Appl. Opt. 46, 6350-6354 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-25-6350
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