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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 25 — Sep. 1, 2007
  • pp: 6375–6380

Design of multiaperture masks for subnanometer correction of ultraprecision optical components

John W. Arkwright  »View Author Affiliations


Applied Optics, Vol. 46, Issue 25, pp. 6375-6380 (2007)
http://dx.doi.org/10.1364/AO.46.006375


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Abstract

A technique for correction of optical surfaces has recently been reported. The technique involves oscillating an optical surface back and forth behind a multiaperture mask to deposit a spatially varying dielectric layer onto the optic to create the desired surface profile. Details are reported of a modified mask design that inherently smooths the deposited layer used for these corrections. Results are also reported with regard to a recent correction that resulted in a thickness uniformity of better than λ∕2000 rms over a working aperture of 37.5 mm.

© 2007 Optical Society of America

OCIS Codes
(220.4610) Optical design and fabrication : Optical fabrication
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 1, 2007
Manuscript Accepted: July 6, 2007
Published: August 27, 2007

Citation
John W. Arkwright, "Design of multiaperture masks for subnanometer correction of ultraprecision optical components," Appl. Opt. 46, 6375-6380 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-25-6375

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