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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 25 — Sep. 1, 2007
  • pp: 6375–6380

Design of multiaperture masks for subnanometer correction of ultraprecision optical components

John W. Arkwright  »View Author Affiliations


Applied Optics, Vol. 46, Issue 25, pp. 6375-6380 (2007)
http://dx.doi.org/10.1364/AO.46.006375


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Abstract

A technique for correction of optical surfaces has recently been reported. The technique involves oscillating an optical surface back and forth behind a multiaperture mask to deposit a spatially varying dielectric layer onto the optic to create the desired surface profile. Details are reported of a modified mask design that inherently smooths the deposited layer used for these corrections. Results are also reported with regard to a recent correction that resulted in a thickness uniformity of better than λ∕2000 rms over a working aperture of 37.5 mm.

© 2007 Optical Society of America

OCIS Codes
(220.4610) Optical design and fabrication : Optical fabrication
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 1, 2007
Manuscript Accepted: July 6, 2007
Published: August 27, 2007

Citation
John W. Arkwright, "Design of multiaperture masks for subnanometer correction of ultraprecision optical components," Appl. Opt. 46, 6375-6380 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-25-6375


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References

  1. J. Arkwright, I. Underhill, N. Pereira, and M. Gross, "Deterministic control of thin film thickness in physical vapor deposition systems using a multi-aperture mask," Opt. Express 13, 2731-2741 (2005). [CrossRef] [PubMed]
  2. J. Arkwright, P. Martin, A. Bendavid, and E. Preston, "Control of thickness uniformity in a filtered cathodic vapor arc system," in SVC 48th Technical Conference Proceedings (Society of Vacuum Coaters, Albuquerque, New Mexico , 2005), p. 108.
  3. L. Jochum, M. Collados, V. Martínez Pillet, J. A. Bonet, J. C. del Toro Iniesta, A. Lopez, A. Alvarez-Herrero, M. Reina, J. Fabregat, and V. Domingo, "IMaX: a visible magnetograph for SUNRISE," Proc. SPIE 4843, 20-29 (2003). [CrossRef]
  4. J. M. Mackowski, L. Pinard, L, Dognin, P. Ganau, B. Lagrange, C. Michel, and M. Morgue, "VIRGO mirrors: wavefront control," Opt. Quantum Electron. 31, 507-514 (1999). [CrossRef]
  5. J. Arkwright, D. Farrant, and J. Zhang, "Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer," Opt. Express 14, 114-119 (2006). [CrossRef] [PubMed]
  6. D. I. Farrant, J. W. Arkwright, P. S. Fairman, and R. P. Netterfield, "Measuring the thickness profiles of wafers to sub-nanometer resolution using Fabry-Perot interferometry," Appl. Opt. 46, 2863-2869 (2007). [CrossRef] [PubMed]
  7. Mastercut Technologies, 22 Leda Drive, Andrews, Queensland 4220, Australia; www.mastercut.com.au.

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