Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography
Applied Optics, Vol. 46, Issue 27, pp. 6783-6792 (2007)
http://dx.doi.org/10.1364/AO.46.006783
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Abstract
Two basic types of interferometer, a point diffraction interferometer (PDI) and a lateral shearing interferometer (LSI) suitable for operation in the extreme-ultraviolet (EUV)
wavelength region, are described. To address the challenges of wavefront measurement with an accuracy of
© 2007 Optical Society of America
OCIS Codes
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
ToC Category:
Interferometry
History
Original Manuscript: December 6, 2006
Revised Manuscript: March 2, 2007
Manuscript Accepted: July 2, 2007
Published: September 19, 2007
Citation
Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, and Masahito Niibe, "Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography," Appl. Opt. 46, 6783-6792 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-27-6783
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