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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 27 — Sep. 20, 2007
  • pp: 6783–6792

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, and Masahito Niibe  »View Author Affiliations


Applied Optics, Vol. 46, Issue 27, pp. 6783-6792 (2007)
http://dx.doi.org/10.1364/AO.46.006783


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Abstract

Two basic types of interferometer, a point diffraction interferometer (PDI) and a lateral shearing interferometer (LSI) suitable for operation in the extreme-ultraviolet (EUV) wavelength region, are described. To address the challenges of wavefront measurement with an accuracy of 0.1   nm rms, we present a calibration method for the PDI that places a mask with two large windows at the image plane of the illumination point light source and a general approach to deriving the phase-shift algorithm series that eliminates the undesired zeroth-order effect in the LSI. These approaches to improving the measurement accuracy were experimentally verified by the wavefront measurements of a Schwarzschild-type EUV projection lens.

© 2007 Optical Society of America

OCIS Codes
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme

ToC Category:
Interferometry

History
Original Manuscript: December 6, 2006
Revised Manuscript: March 2, 2007
Manuscript Accepted: July 2, 2007
Published: September 19, 2007

Citation
Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, and Masahito Niibe, "Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography," Appl. Opt. 46, 6783-6792 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-27-6783


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References

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