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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 28 — Oct. 1, 2007
  • pp: 7054–7060

Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-x-ray flat-field spectrograph in the region of 1.7 keV

Takashi Imazono, Masahiko Ishino, Masato Koike, Hiroyuki Sasai, and Kazuo Sano  »View Author Affiliations

Applied Optics, Vol. 46, Issue 28, pp. 7054-7060 (2007)

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A multilayer laminar-type holographic grating having an average groove density of 2400 lines / mm is designed and fabricated for use with a soft-x-ray flat-field spectrograph covering the 0.70 0.75   nm region. A varied-line-spaced groove pattern is generated by the use of an aspheric wavefront recording system, and laminar-type grooves are formed by a reactive ion-etching method. Mo / SiO 2 multilayers optimized for the emission lines of Hf-M, Si-K, and W-M are deposited on one of the three designated areas on the grating surface in tandem. The measured first-order diffraction efficiencies at the respective centers of the areas are 18%–20%. The flat-field spectrograph equipped with the grating indicates a spectral linewidth of 8 14   eV for the emission spectra generated from electron-impact x-ray sources.

© 2007 Optical Society of America

OCIS Codes
(230.1950) Optical devices : Diffraction gratings
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Optical Devices

Original Manuscript: June 18, 2007
Manuscript Accepted: July 31, 2007
Published: September 27, 2007

Takashi Imazono, Masahiko Ishino, Masato Koike, Hiroyuki Sasai, and Kazuo Sano, "Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-x-ray flat-field spectrograph in the region of 1.7 keV," Appl. Opt. 46, 7054-7060 (2007)

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