A multilayer laminar-type holographic grating having an average groove density of
is designed and fabricated for use with a soft-x-ray flat-field spectrograph covering the
region. A varied-line-spaced groove pattern is generated by the use of an aspheric wavefront recording system, and laminar-type grooves are formed by a reactive ion-etching method.
multilayers optimized for the emission lines of Hf-M,
Si-K, and W-M are deposited on one of the three designated areas on the grating surface in tandem. The measured first-order diffraction efficiencies at the respective centers of the areas are 18%–20%. The flat-field spectrograph equipped with the grating indicates a spectral linewidth of
for the emission spectra generated from electron-impact x-ray sources.
© 2007 Optical Society of America
(230.1950) Optical devices : Diffraction gratings
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
Original Manuscript: June 18, 2007
Manuscript Accepted: July 31, 2007
Published: September 27, 2007
Takashi Imazono, Masahiko Ishino, Masato Koike, Hiroyuki Sasai, and Kazuo Sano, "Fabrication and evaluation of a wideband multilayer laminar-type holographic grating for use with a soft-x-ray flat-field spectrograph in the region of 1.7 keV," Appl. Opt. 46, 7054-7060 (2007)