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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 46, Iss. 34 — Dec. 1, 2007
  • pp: 8346–8350

Effective formation method for an aspherical microlens array based on an aperiodic moving mask during exposure

Lifang Shi, Chunlei Du, Xiaochun Dong, Qiling Deng, and Xiangang Luo  »View Author Affiliations

Applied Optics, Vol. 46, Issue 34, pp. 8346-8350 (2007)

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An aperiodic mask design method for fabricating a microlens array with an aspherical profile is proposed. The nonlinear relationship between exposure doses and lens profile is considered, and the select criteria of quantization interval and fabrication range of the method are given. The mask function of a quadrangle microlens array with a hyperboloid profile used in the infrared was constructed by using this method. The microlens array can be effectively fabricated during a one time exposure process using the mask. Reactive ion etching was carried out to transfer the structure into the substrate of germanium. The measurement results indicate that the roughness is less than 10   nm (pv), and the profile error is less than 40 nm (rms).

© 2007 Optical Society of America

OCIS Codes
(080.3620) Geometric optics : Lens system design
(080.3630) Geometric optics : Lenses
(220.4000) Optical design and fabrication : Microstructure fabrication

Original Manuscript: September 4, 2007
Revised Manuscript: October 8, 2007
Manuscript Accepted: October 16, 2007
Published: November 30, 2007

Lifang Shi, Chunlei Du, Xiaochun Dong, Qiling Deng, and Xiangang Luo, "Effective formation method for an aspherical microlens array based on an aperiodic moving mask during exposure," Appl. Opt. 46, 8346-8350 (2007)

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