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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 35 — Dec. 10, 2007
  • pp: 8385–8393

Network search method in the design of extreme ultraviolet lithographic objectives

Oana Marinescu and Florian Bociort  »View Author Affiliations


Applied Optics, Vol. 46, Issue 35, pp. 8385-8393 (2007)
http://dx.doi.org/10.1364/AO.46.008385


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Abstract

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when control parameters, such as aperture and field, are varied, and constraints are used to limit the variation domain of the variables. A good solution in a network, obtained with a limited number of variables, has been locally optimized with all variables to meet practical requirements.

© 2007 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.2740) Optical design and fabrication : Geometric optical design
(220.3620) Optical design and fabrication : Lens system design
(220.3740) Optical design and fabrication : Lithography
(220.4830) Optical design and fabrication : Systems design

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: July 16, 2007
Revised Manuscript: October 14, 2007
Manuscript Accepted: October 16, 2007
Published: December 3, 2007

Citation
Oana Marinescu and Florian Bociort, "Network search method in the design of extreme ultraviolet lithographic objectives," Appl. Opt. 46, 8385-8393 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-35-8385


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