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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 46, Iss. 9 — Mar. 20, 2007
  • pp: 1411–1415

Wavefront error measurement of high-numerical-aperture optics with a Shack–Hartmann sensor and a point source

Jin-Seok Lee, Ho-Soon Yang, and Jae-Won Hahn  »View Author Affiliations


Applied Optics, Vol. 46, Issue 9, pp. 1411-1415 (2007)
http://dx.doi.org/10.1364/AO.46.001411


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Abstract

We developed a new, to the best of our knowledge, test method to measure the wavefront error of the high-NA optics that is used to read the information on the high-capacity optical data storage devices. The main components are a pinhole point source and a Shack–Hartmann sensor. A pinhole generates the high-NA reference spherical wave, and a Shack–Hartmann sensor constructs the wavefront error of the target optics. Due to simplicity of the setup, it is easy to use several different wavelengths without significant changes of the optical elements in the test setup. To reduce the systematic errors in the system, a simple calibration method was developed. In this manner, we could measure the wavefront error of the NA 0.9 objective with the repeatability of 0.003λ rms ( λ = 632.8 n m ) and the accuracy of 0.01λ rms.

© 2007 Optical Society of America

OCIS Codes
(010.7350) Atmospheric and oceanic optics : Wave-front sensing
(120.3930) Instrumentation, measurement, and metrology : Metrological instrumentation
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(220.4840) Optical design and fabrication : Testing

History
Original Manuscript: August 11, 2006
Revised Manuscript: October 25, 2006
Manuscript Accepted: October 26, 2006
Published: March 1, 2007

Citation
Jin-Seok Lee, Ho-Soon Yang, and Jae-Won Hahn, "Wavefront error measurement of high-numerical-aperture optics with a Shack-Hartmann sensor and a point source," Appl. Opt. 46, 1411-1415 (2007)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-46-9-1411

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