OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 12 — Apr. 20, 2008
  • pp: 2109–2115

Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet

Sébastien de Rossi, Denis Joyeux, Pierre Chavel, Nelson de Oliveira, Marieke Richard, Christophe Constancias, and Jean-Yves Robic  »View Author Affiliations

Applied Optics, Vol. 47, Issue 12, pp. 2109-2115 (2008)

View Full Text Article

Enhanced HTML    Acrobat PDF (4414 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



We use low coherence interferometry to investigate the depth structure of a complex multilayer stack reflector. The probing instrument is an interferometer based on a Fresnel’s bi-mirror illuminated by relatively wide-band synchrotron undulator light near 13.5 nm . Simulations clearly confirm that our test object generates two back propagated signals that behave as if reflected on two effective planes. First results in this spectral range may open the way to a new physical approach to extreme ultraviolet sample characterization in the form of line-scan optical coherence tomography.

© 2008 Optical Society of America

OCIS Codes
(260.3160) Physical optics : Interference
(260.7200) Physical optics : Ultraviolet, extreme

ToC Category:
Physical Optics

Original Manuscript: November 26, 2007
Revised Manuscript: March 1, 2008
Manuscript Accepted: March 25, 2008
Published: April 17, 2008

Sébastien de Rossi, Denis Joyeux, Pierre Chavel, Nelson de Oliveira, Marieke Richard, Christophe Constancias, and Jean-Yves Robic, "Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet," Appl. Opt. 47, 2109-2115 (2008)

Sort:  Year  |  Journal  |  Reset  


  1. T. W. Barbee Jr., S. Mrowka, and M. C. Hettrick, “Molybdenum-silicon multilayer mirrors for the extreme ultraviolet,” Appl. Opt. 24, 883-886 (1985).
  2. J. Gautier, F. Delmotte, M. Rouillay, F. Bridou, M. F. Ravet, and A. Jérôme, “Study of normal incidence three component multilayer mirrors in the range 20 nm-40 nm,” Appl. Opt. 44 (3), 384-390 (2005). [CrossRef]
  3. R. M. Fechtchenko, A. V. Vinogradova, and D. L. Voronov, “Optical properties of sliced multilayer gratings,” Opt. Commun. 210, 179-186 (2002). [CrossRef]
  4. M. D. Levinson, N. S. Viswanathan, and R. A. Simpson, “Improving resolution in photolithography with a phase-shifting mask,” IEEE Trans. Electron Devices ED-29 (1982).
  5. T. Ito and S. Okazaki, “Pushing the limits of lithography,” Nature (London) 406 (6799), 1027-1031 (2000).
  6. J. Svatos, D. Joyeux, D. Phalippou, and F. Polack, “Soft-x-ray interferometer for measuring the refractive index of materials,” Opt. Lett. 18 (16), 1367-1369 (1993).
  7. C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, and D. Attwood, “Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer,” Opt. Lett. 27, 1028-1030 (2002). [CrossRef]
  8. L. B. Da Silva, T. W. Barbee Jr., R. Cauble, P. Celliers, D. Ciarlo, S. Libby, R. A. London, D. Matthews, S. Mrowka, J. C. Moreno, D. Ress, J. E. Trebes, A. S. Wan, and F. Weber, “Electron density measurements of high density plasmas using soft x-ray laser interferometry,” Phys. Rev. Lett. 74, 3991-3994 (1995). [CrossRef]
  9. R. F. Smith, J. Dunn, J. Nilsen, J. R. Hunter, V. N. Shlyaptsev, J. J. Rocca, J. Filevich, and M. C. Marconi, “Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas,” J. Opt. Soc. Am. B 20, 254-259 (2003). [CrossRef]
  10. P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood, and J. Bokor, “Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy,” Appl. Opt. 38, 7252-7263 (1999).
  11. M. Richard, D. Constancias, D. Joyeux, J. Y. Robic, S. de Rossi, and N. de Oliveira, “EUV phase shift masks samples at wavelength phase shift measurements on dedicated samples,” in The Proceedings of the 5th International EUVL Symposium (October 8-10 2006).
  12. P. P. Naulleau and K. A. Goldberg, “Dual-domain point diffraction interferometer,” Appl. Opt. 383523-3533 (1999).
  13. J. J. Rocca, C. H. Moreno, M. C. Marconi, and K. Kanizay, “Soft-x-ray laser interferometry of a plasma with a tabletop laser and a Lloyd's mirror,” Opt. Lett. 24, 420-422 (1999).
  14. L. B. Da Silva, T. W. Barbee Jr., R. Cauble, P. Celliers, D. Ciarlo,J. C. Moreno, S. Mrowka, J. E. Trebes, A. S. Wan, and F. Weber, “Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics,” Appl. Opt. 34, 6389-6392 (1995).
  15. Y. Zhu, K. Sugisaki, M. Okada, K. Otaki, Z. Liu, J. Kawakami, M. Ishii, J. Saito, K. Murakami, M. Hasegawa, C. Ouchi, S. Kato, T. Hasegawa, A. Suzuki, H. Yokota, and M. Niibe, “Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography,” Appl. Opt. 46, 6783-6792 (2007). [CrossRef]
  16. F. Polack, D. Joyeux, J. Svatos, and D. Phalippou, “Applications of wavefront division interferometers in soft x rays,” Rev. Sci. Instrum. 66 (2), 2180-2183 (1995).
  17. M. Takeda, H. Ina, and S. Kobayashi, “Fourier-transform method of fringe-pattern analysis for computer-based topography and interferogram,” J. Opt. Soc. Am. A 72, 156 (1982).
  18. D. Huang, E. A. Swanson, C. P. Lin, J. S. Schuman, W. G. Stinson, W. Wang, M. R. Hee, T. Flolte, K. Gregory, C. A. Pulia, and J. Fujimoto, “Optical coherence tomography,” Science 254, 1178-1181 (1991). [CrossRef]
  19. B. Povazay, K. Bizheva, A. Unterhuber, B. Hermann, H. Sattmann, A. F. Fercher, W. Drexler, A. Apolonski, W. J. Wadsworth, J. C. Knight, P. St. J. Russell, M. Vetterlein, and E. Scherzer, “Submicrometer axial resolution optical coherence tomography,” Opt. Lett. 27 (20), 1800-1802 (2002). [CrossRef]
  20. D. L. Windt, “XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr3C2, Mo and W,” Appl. Opt. 30, 15-25 (1991).
  21. R. Soufli and E. M. Gullikson, “Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region,” Appl. Opt. 36, 5499-5507 (1997).
  22. R. Soufli and E. M. Gullikson, “Absolute photoabsorption measurements of molybdenum in the range 60 to 930 eV for optical constant determination,” Appl. Opt. 37, 1713-1719 (1998).
  23. C. Tarrio, R. N. Watts, T. B. Lucatorto, J. M. Slaughter, and C. M. Falco, “Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials,” Appl. Opt. 37, 4100-4104 (1998).
  24. E. Spiller, Soft X-Ray Optics (SPIE Optical Engineering Press, 1994).
  25. M. Born and E. Wolf, Principle of Optics (Pergamon, 1970).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


Fig. 1 Fig. 2 Fig. 3
Fig. 4 Fig. 5

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited