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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 12 — Apr. 20, 2008
  • pp: 2109–2115

Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet

Sébastien de Rossi, Denis Joyeux, Pierre Chavel, Nelson de Oliveira, Marieke Richard, Christophe Constancias, and Jean-Yves Robic  »View Author Affiliations


Applied Optics, Vol. 47, Issue 12, pp. 2109-2115 (2008)
http://dx.doi.org/10.1364/AO.47.002109


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Abstract

We use low coherence interferometry to investigate the depth structure of a complex multilayer stack reflector. The probing instrument is an interferometer based on a Fresnel’s bi-mirror illuminated by relatively wide-band synchrotron undulator light near 13.5 nm . Simulations clearly confirm that our test object generates two back propagated signals that behave as if reflected on two effective planes. First results in this spectral range may open the way to a new physical approach to extreme ultraviolet sample characterization in the form of line-scan optical coherence tomography.

© 2008 Optical Society of America

OCIS Codes
(260.3160) Physical optics : Interference
(260.7200) Physical optics : Ultraviolet, extreme

ToC Category:
Physical Optics

History
Original Manuscript: November 26, 2007
Revised Manuscript: March 1, 2008
Manuscript Accepted: March 25, 2008
Published: April 17, 2008

Citation
Sébastien de Rossi, Denis Joyeux, Pierre Chavel, Nelson de Oliveira, Marieke Richard, Christophe Constancias, and Jean-Yves Robic, "Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet," Appl. Opt. 47, 2109-2115 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-12-2109


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