OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: 2443–2451

Time exposure performance of Mo–Au Gibbsian segregating alloys for extreme ultraviolet collector optics

Huatan Qiu, Shailendra N. Srivastava, Keith C. Thompson, Martin J. Neumann, and David N. Ruzic  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. 2443-2451 (2008)
http://dx.doi.org/10.1364/AO.47.002443


View Full Text Article

Enhanced HTML    Acrobat PDF (7313 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the surface chemistry causing the mirrors to suffer less damage, is crucial for this technology development. A Mo–Au Gibbsian segregation (GS) alloy is deposited on Si using a dc dual-magnetron cosputtering system and the damage is investigated as a result of time dependent exposure in an EUV source. A thin Au segregating layer is maintained through segregation during exposure, even though overall erosion in the Mo–Au sample is taking place in the bulk. The reflective material, Mo, underneath the segregating layer is protected by this sacrificial layer, which is lost due to preferential sputtering. In addition to theoretical work, experimental results are presented on the effectiveness of the GS alloys to be used as potential EUV collector optics material.

© 2008 Optical Society of America

OCIS Codes
(040.7480) Detectors : X-rays, soft x-rays, extreme ultraviolet (EUV)
(160.4670) Materials : Optical materials

ToC Category:
X-ray Optics

History
Original Manuscript: October 11, 2007
Revised Manuscript: January 19, 2008
Manuscript Accepted: March 6, 2008
Published: April 28, 2008

Citation
Huatan Qiu, Shailendra N. Srivastava, Keith C. Thompson, Martin J. Neumann, and David N. Ruzic, "Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics," Appl. Opt. 47, 2443-2451 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-2443

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited