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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C107–C113

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, and Michel Lequime  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C107-C113 (2008)

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A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or H f O 2 starting material), reactive low voltage ion plating, and dual ion beam sputtering. The laser damage thresholds of these coatings are determined at 1064 and 355 n m using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy.

© 2008 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films

Original Manuscript: August 6, 2007
Manuscript Accepted: September 17, 2007
Published: November 29, 2007

Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, Mireille Commandré, Michel Cathelinaud, Cian Koc, and Michel Lequime, "Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering," Appl. Opt. 47, C107-C113 (2008)

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