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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C131–C134

Elastic and plastic relaxation of densified SiO2 films

Jue Wang, Robert L. Maier, and Horst Schreiber  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C131-C134 (2008)

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Ion- and plasma-assisted deposition has been extensively used for the fabrication of high-performance optical films with dense and smooth microstructures that are essential for applications such as low-loss and environmentally stable optics. SiO 2 is a well-known amorphous material suitable for energetic deposition. SiO 2 single layers and SiO 2 -based single-cavity narrow-bandpass filters were prepared by plasma-ion-assisted deposition. The refractive index and film thickness were determined by variable-angle spectroscopic ellipsometry. The high compressive stress of the densified film was correlated to increased packing density. The center wavelength shift of the narrow-bandpass filters as a function of sample-temperature as well as high-temperature annealing was determined via spectral transmission measurement. Structural relaxation of the densified SiO 2 films was observed from the variation of the refractive index and physical thickness for the single layers and the center wavelength shift for the narrow-bandpass filters, suggesting elastic and plastic deformation of the densified films corresponding to a reversible and an irreversible center wavelength shift, respectively.

© 2008 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: July 23, 2007
Revised Manuscript: October 17, 2007
Manuscript Accepted: October 19, 2007
Published: November 30, 2007

Jue Wang, Robert L. Maier, and Horst Schreiber, "Elastic and plastic relaxation of densified SiO2 films," Appl. Opt. 47, C131-C134 (2008)

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