OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C135–C142

Characterization of low losses in optical thin films and materials

Christian Mühlig, Wolfgang Triebel, Siegfried Kufert, and Simon Bublitz  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C135-C142 (2008)
http://dx.doi.org/10.1364/AO.47.00C135


View Full Text Article

Enhanced HTML    Acrobat PDF (1243 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Residual absorption in optical coatings and materials is directly measured by means of the laser-induced deflection (LID) technique. For transmissive coatings a measurement strategy is introduced that allows for the separation of different absorptions of the investigated sample (bulk, coating, surface) by use of only one sample. Laser irradiation yields absorption values between 2 × 10 3 and 2.9 × 10 2 for antireflecting and highly reflecting (HR) coatings at 193 nm and 30.6 × 10 6 for a HR mirror at 527 nm . Use of laser-induced fluorescence at 193 nm excitation reveals trivalent cerium and prasodymium and hydrocarbons in different single layers and coatings. In addition to correlation with absorption data, the influence of a high fluorescence quantum yield on the absorption measurement is discussed.

© 2008 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(160.4670) Materials : Optical materials
(300.1030) Spectroscopy : Absorption
(300.2530) Spectroscopy : Fluorescence, laser-induced
(310.0310) Thin films : Thin films

History
Original Manuscript: August 2, 2007
Revised Manuscript: October 15, 2007
Manuscript Accepted: October 19, 2007
Published: December 3, 2007

Citation
Christian Mühlig, Wolfgang Triebel, Siegfried Kufert, and Simon Bublitz, "Characterization of low losses in optical thin films and materials," Appl. Opt. 47, C135-C142 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C135


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. E. Eva and K. Mann, "Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials," Appl. Phys. A 62, 143-149 (1996). [CrossRef]
  2. S. Gliech, H. Gessner, A. Hultaker, and A. Duparre, "157- and 193-nm scatter, R, and T measurement technique," Proc. SPIE 5250, 137-145 (2004). [CrossRef]
  3. M. Guntau and W. Triebel, "Novel method to measure bulk absorption in optically transparent materials," Rev. Sci. Instrum. 71, 2279-2282 (2000). [CrossRef]
  4. W. Triebel, Ch. Mühlig, and S. Kufert, "Application of the laser induced deflection (LID) technique for low absorption measurements in bulk materials and coatings," Proc. SPIE 5965, 59651J (2005). [CrossRef]
  5. Ch. Mühlig, W. Triebel, S. Kufert, Ch. Noppeney, and H. Bernitzki, "Direct Measurements of Residual Absorption in fluoridic thin films and optical materials for DUV laser applications," Proc. SPIE 6403, 640317 (2007). [CrossRef]
  6. Ch. Mühlig, W. Triebel, H. Bernitzki, M. Klaus, J. Bergmann, S. thereforeKufert, and S. Bublitz, "Absorption and fluorescence measurements of DUV/VUV coatings," Proc. SPIE 5963, 59630P(2005). [CrossRef]
  7. Ch. Mühlig, W. Triebel, G. Töpfer, and A. Jordanov, "Calcium fluoride for ArF laser lithography--characterization by in situ transmission and LIF measurements," Proc. SPIE , 4932, 458-466 (2003). [CrossRef]
  8. U. Natura, Ch. Mühlig, W. Triebel, Ch. Görling, U. Leinhos, K. Mann, E. Eva, and A. Pfeiffer, "Characterization of 193 nm light absorption in fused silica and calcium fluoride by various measurement techniques (Round-Robin experiments)," CHOCLAB II -Brochure to the final presentation of the Eureka project EU-2359, VDI Technology Center (2003), pp. 280-294.
  9. K. H. Yang and J. A. DeLuca, "uv fluorescence of cerium-doped lutetium and lanthanum trifluorides, potential tunable coherent sources from 2760 to 3220 Å," Appl. Phys. Lett. 31, 594-596 (1977). [CrossRef]
  10. L. R. Elias, Wm. S. Heaps, and W. M. Yen, "Excitation of uv fluorescence in LaF3 doped with trivalent cerium and praseodymium," Phys. Rev. B 8, 4989-4995 (1973). [CrossRef]
  11. J. Heber, C. Mühlig, W. Triebel, N. Danz, R. Thielsch, and N. Kaiser, "Deep UV laser induced fluorescence in fluoride thin films," Appl. Phys. A 76, 123-128 (2003). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited