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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C162–C166

Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm

Christopher J. Stolz, Scott Hafeman, and Thomas V. Pistor  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C162-C166 (2008)
http://dx.doi.org/10.1364/AO.47.00C162


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Abstract

Electric-field modeling provides insight into the laser damage resistance potential of nodular defects. The laser-induced damage threshold for high-reflector coatings is 13 × lower at the third harmonic ( 351 n m ) than at the first harmonic ( 1053 n m ) wavelength. Linear and multiphoton absorption increases with decreasing wavelength, leading to a lower-third harmonic laser resistance. Electric-field effects can also be a contributing mechanism to the lower laser resistance with decreasing wavelength. For suitably large inclusions, the nodule behaves as a microlens. The diffraction-limited spot size decreases with wavelength, resulting in an increase in intensity. Comparison of electric-field finite-element simulations illustrates a 3× to 16× greater light intensification at the shorter wavelength.

© 2008 Optical Society of America

OCIS Codes
(000.4430) General : Numerical approximation and analysis
(140.3330) Lasers and laser optics : Laser damage
(240.0310) Optics at surfaces : Thin films
(290.4020) Scattering : Mie theory
(290.5850) Scattering : Scattering, particles
(310.1620) Thin films : Interference coatings

History
Original Manuscript: August 3, 2007
Manuscript Accepted: September 9, 2007
Published: December 11, 2007

Citation
Christopher J. Stolz, Scott Hafeman, and Thomas V. Pistor, "Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm," Appl. Opt. 47, C162-C166 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C162


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References

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