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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C185–C188

Analysis of dip coating processing parameters by double optical monitoring

Flavio Horowitz and Alexandre F. Michels  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C185-C188 (2008)

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Double optical monitoring is applied to determine the influence of main process parameters on the formation of sulfated zirconia and self-assembled mesoporous silica solgel films by dip coating. In addition, we analyze, for the first time to the best of our knowledge, the influence of withdrawal speed, temperature, and relative humidity on refractive-index and physical thickness variations (uncertainties of ± 0.005 and ± 7 n m ) during the process. Results provide insight into controlled production of single and multilayer films from complex fluids by dip coating.

© 2008 Optical Society of America

OCIS Codes
(260.3160) Physical optics : Interference
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: August 30, 2007
Manuscript Accepted: October 26, 2007
Published: December 20, 2007

Flavio Horowitz and Alexandre F. Michels, "Analysis of dip coating processing parameters by double optical monitoring," Appl. Opt. 47, C185-C188 (2008)

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