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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C288–C292

Sputter deposition of silicon oxynitride gradient and multilayer coatings

Jörn Weber, Hagen Bartzsch, and Peter Frach  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C288-C292 (2008)
http://dx.doi.org/10.1364/AO.47.00C288


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Abstract

The optical properties of silicon oxynitride films deposited by reactive dc magnetron sputtered films have been investigated. In particular the absorption characteristics of silicon nitride thin films in the visible spectrum and their optical bandgap were analyzed with regard to their composition and deposition properties. It can be shown that there is a significant difference between the absorption in the visible spectrum and the optical bandgap for these layers. The influence of unipolar and bipolar pulse modes on the optical layer properties is presented. The extinction coefficient for silicon nitride single layers could be reduced to a value of 2 × 10 4 at 500 nm without external heating. There is also the dependence of the absorption of silicon oxynitride layers on the discharge voltage. We present the resulting spectra of rugate and edge filters that consist of these layers and offer lower absorption than single layers.

© 2008 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

History
Original Manuscript: August 6, 2007
Revised Manuscript: January 4, 2008
Manuscript Accepted: January 7, 2008
Published: February 20, 2008

Citation
Jörn Weber, Hagen Bartzsch, and Peter Frach, "Sputter deposition of silicon oxynitride gradient and multilayer coatings," Appl. Opt. 47, C288-C292 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C288

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