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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C310–C314

High reflectivity multilayer for He-II radiation at 30.4 nm

Jingtao Zhu, Zhanshan Wang, Zhong Zhang, Fengli Wang, Hongchang Wang, Wenjuan Wu, Shumin Zhang, Da Xu, Lingyan Chen, Hongjun Zhou, Tonglin Huo, Mingqi Cui, and Yidong Zhao  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C310-C314 (2008)

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SiC∕Mg and B 4 C ∕Mo∕Si multilayers were designed for He-II radiation at 30.4 nm. These multilayers were prepared by use of a direct current magnetron sputtering system and measured at the National Synchrotron Radiation Laboratory, China. The measured reflectivities were 38.0% for the SiC∕Mg multilayer at an incident angle of 12 deg and 32.5% for the B 4 C ∕Mo∕Si multilayer at 5 deg, respectively. A dual-function multilayer mirror was also designed by use of the aperiodic SiC∕Mg multilayer. Annealing experiments were performed to investigate the thermal stability of the SiC∕Mg multilayer. The interface of the SiC∕Mg multilayer before and after annealing was studied by electron-induced x-ray emission spectra, which evidences the absence of thermal reaction products at the interfaces after annealing.

© 2008 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(340.6720) X-ray optics : Synchrotron radiation
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(350.1270) Other areas of optics : Astronomy and astrophysics

Original Manuscript: August 3, 2007
Revised Manuscript: December 7, 2007
Manuscript Accepted: December 12, 2007
Published: February 26, 2008

Jingtao Zhu, Zhanshan Wang, Zhong Zhang, Fengli Wang, Hongchang Wang, Wenjuan Wu, Shumin Zhang, Da Xu, Lingyan Chen, Hongjun Zhou, Tonglin Huo, Mingqi Cui, and Yidong Zhao, "High reflectivity multilayer for He-II radiation at 30.4 nm," Appl. Opt. 47, C310-C314 (2008)

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