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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C319–C323

Optical properties and residual stress of YbF 3 thin films deposited at different temperatures

Ying Wang, Yue-guang Zhang, Wei-lan Chen, Wei-dong Shen, Xu Liu, and Pei-fu Gu  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C319-C323 (2008)

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The influence of deposition temperature on the optical properties, microstructure, and residual stress of YbF 3 films, deposited by electron-beam evaporation, has been investigated. The increased refractive indices and surface roughness of YbF 3 films indicate that the film density and columnar structure size increase with deposition temperature. At the same time, higher packing density reduces absorption of moisture. The residual stress is related to deposition temperature and to substrate. For the samples deposited on BK7, the residual stress mainly comes from intrinsic stress, however, for those on fused silica, thermal stress is the dominant factor of total residual stress.

© 2008 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Original Manuscript: July 30, 2007
Revised Manuscript: January 13, 2008
Manuscript Accepted: January 15, 2008
Published: March 21, 2008

Ying Wang, Yue-guang Zhang, Wei-lan Chen, Wei-dong Shen, Xu Liu, and Pei-fu Gu, "Optical properties and residual stress of YbF3 thin films deposited at different temperatures," Appl. Opt. 47, C319-C323 (2008)

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