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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C41–C45

Process for deposition of AlF3 thin films

Bo-Huei Liao, Ming-Chung Liu, and Cheng-Chung Lee  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C41-C45 (2008)
http://dx.doi.org/10.1364/AO.47.000C41


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Abstract

We fabricated aluminum fluoride ( AlF 3 ) thin films by pulsed DC magnetron sputtering with various CF 4 flow rates and sputtering powers. Our method is distinct from the conventional deposition process in that we used inexpensive Al (99.99% purity) as the target instead of an expensive fluoride compound. The optical properties and microstructure of the thin films were examined. The optical quality of AlF 3 thin films deposited at a 20   W sputtering power and injected 110   SCCM (SCCM denotes cubic centimeters per minute at standard temperature and pressure) CF 4 flow at room temperature showed improvement with an extinction coefficient of less than 7 × 10 - 4 at 193   nm . The deposition of AlF 3 thin films at different substrate temperatures and annealed by UV light was also investigated.

© 2008 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

History
Original Manuscript: August 3, 2007
Revised Manuscript: September 16, 2007
Manuscript Accepted: September 17, 2007
Published: November 6, 2007

Citation
Bo-Huei Liao, Ming-Chung Liu, and Cheng-Chung Lee, "Process for deposition of AlF3 thin films," Appl. Opt. 47, C41-C45 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C41

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