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Applied Optics

Applied Optics


  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C75–C78

Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry–Perot interference filter

Hee Young Kang and Chang Kwon Hwangbo  »View Author Affiliations

Applied Optics, Vol. 47, Issue 13, pp. C75-C78 (2008)

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We have designed what we believe to be new hybrid-type attenuated phase-shift masks for extreme-ultraviolet optical lithography by use of a Fabry–Perot interference filter. The designs for the attenuated phase-shift masks show a smaller step height for less geometric shadow effects than additive- and subtractive-type attenuated phase-shift masks, a contrast higher than 94% for both deep-ultraviolet and extreme-ultraviolet wavelength regimes, and a 180° phase-shift in the extreme-ultraviolet wavelength regime.

© 2008 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
(310.0310) Thin films : Thin films
(310.4165) Thin films : Multilayer design

Original Manuscript: August 3, 2007
Manuscript Accepted: October 5, 2007
Published: November 27, 2007

Hee Young Kang and Chang Kwon Hwangbo, "Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter," Appl. Opt. 47, C75-C78 (2008)

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