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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 47, Iss. 13 — May. 1, 2008
  • pp: C75–C78

Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry–Perot interference filter

Hee Young Kang and Chang Kwon Hwangbo  »View Author Affiliations


Applied Optics, Vol. 47, Issue 13, pp. C75-C78 (2008)
http://dx.doi.org/10.1364/AO.47.000C75


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Abstract

We have designed what we believe to be new hybrid-type attenuated phase-shift masks for extreme-ultraviolet optical lithography by use of a Fabry–Perot interference filter. The designs for the attenuated phase-shift masks show a smaller step height for less geometric shadow effects than additive- and subtractive-type attenuated phase-shift masks, a contrast higher than 94% for both deep-ultraviolet and extreme-ultraviolet wavelength regimes, and a 180° phase-shift in the extreme-ultraviolet wavelength regime.

© 2008 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
(310.0310) Thin films : Thin films
(310.4165) Thin films : Multilayer design

History
Original Manuscript: August 3, 2007
Manuscript Accepted: October 5, 2007
Published: November 27, 2007

Citation
Hee Young Kang and Chang Kwon Hwangbo, "Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter," Appl. Opt. 47, C75-C78 (2008)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-47-13-C75


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References

  1. International Technology Roadmap for Semiconductors 2006 Update (Semiconductor Industry Association, 2006).
  2. S.-I. Han, E. Weisbrod, J. R. Wasson, R. Gregory, Q. Xie, and P. J. S. Mangat, "Development of phase shift masks for extreme ultra violet lithography and optical evaluation of phase shift materials," Proc. SPIE 5374, 261-270 (2004). [CrossRef]
  3. K. Otaki, "Asymmetric properties of the aerial image in extreme ultraviolet lithography," Jpn. J. Appl. Phys. 39, 6819-6826 (2000). [CrossRef]
  4. A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, and F. Van Roey, "EUV lithography program at IMEC," Proc. SPIE 6517, 651709 (2007). [CrossRef]
  5. H. L. Chen, H. C. Cheng, T. S. Ko, F. H. Ko, and T. C. Chu, "High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes," J. Vac. Sci. Technol. B 22, 3049-3052 (2004). [CrossRef]
  6. M. Sugawara, A. Chiba, and I. Nishiyama, "Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography," J. Vac. Sci. Technol. B 21, 2701-2705 (2003). [CrossRef]
  7. S.-I. Han, E. Weisbrod, Q. Xie, and P. J. S. Mangat, "Design and method of fabricating phase-shift masks for extreme ultraviolet lithography by partial etching into the EUV multilayer mirror," Proc. SPIE 5037, 314-330 (2003). [CrossRef]
  8. B. L. Henke, E. M. Gullikson, and J. C. Davis, "X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50-30,000 eV, Z = 1-92," At. Data Nucl. Data Tables 54, 181-342 (1993), see also http://www-cxro.lbl.gov/. [CrossRef]
  9. E. D. Palik, Handbook of Optical Constants of Solids (Academic, 1998).
  10. P. Yeh, Optical Waves in Layered Media (Wiley, 1988).
  11. B. G. Eynon and B. Wu, Photomask Fabrication Technology (McGraw-Hill, 2005).
  12. H. A. Macleod, Thin-Film Optical Filters, 3rd ed. (Institute of Physics, 2001). [CrossRef]

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